| abstract |
Provided is a photodestructive quencher capable of improving line width roughness and local dimensional uniformity without sacrificing resolution and sensitivity. A photodestructible quencher of formula (I), a photodestructible quencher, a photoresist composition containing an acid-sensitive polymer and a photoacid generator, and a method for producing a relief image using the photoresist composition. (The groups and variables of formula (I) are the same as those described herein.) [Selection figure] None |