| abstract |
[Problem] A plasma processing apparatus and a processing method of an object to be processed for treating a mask of an object to be processed are provided. [Solution Solution] Plasma comprising a processing container, a mounting table for mounting an object to be processed in the processing container, an outer peripheral member disposed around the mounting table, and a first voltage applying device for applying a voltage to the outer peripheral member A processing method for processing an object to be processed using a processing apparatus, comprising: preparing a to-be-processed object having an etched film, a patterned mask formed on the etched film, and a step of processing the mask The process of processing the mask includes: supplying a first processing gas containing a first rare gas to the processing container; and applying the direct current voltage to the outer peripheral member while the mask is located on the outer peripheral portion of the object to be processed. And a first plasma treatment step of treating the plasma with the first treatment gas. |