http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200035925-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
| filingDate | 2020-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03fa7fc5b8b677f6f7d1ca0a80e7663c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f2b8e48e50606a8f84cfc4db058887e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6649b81c3b891d150780c9651224fba5 |
| publicationDate | 2020-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20200035925-A |
| titleOfInvention | Substrate processing apparatus and gas introduction plate |
| abstract | A substrate processing apparatus for mounting a substrate on a mounting table in a processing container and supplying gas to process the substrate. The substrate processing device is provided to face the mounting table, and the processing space where the substrate is disposed and the first gas diffuse. A partition provided between the diffusion spaces, a first gas supply part for supplying the first gas to the diffusion space, and a first gas formed through the partition part in a thickness direction and diffused in the diffusion space It includes a plurality of first gas discharge holes for discharging to the processing space, and a plurality of second gas discharge holes opening to the gas discharge surface on the processing space side in the partition. The second gas supply unit independently supplies the second gas to the plurality of regions arranged in the transverse direction in the processing space independently of the first gas. |
| priorityDate | 2017-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.