| abstract |
The curable composition for imprints, the polymeric composition for imprints, the hardened | cured material, the pattern manufacturing method, the lithographic method, the pattern, and the mask for lithography which provide adhesiveness with the board | substrate at the time of using hardened | cured material, and excellent in storage stability are provided. Curable composition for imprints containing the compound represented by following formula (1), radically polymerizable compounds other than the compound represented by Formula (1), and an optical radical polymerization initiator; In formula (1), R < 1> and R < 2> is respectively independently a hydrogen atom or a C1-C8 organic group, may combine with each other, and may form the ring; R 3 is a monovalent organic group; R 4 and R 5 are each independently a hydrogen atom or a monovalent organic group. |