http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200003616-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c3bf98aa6d4de2752f2f6fac638dc2cd
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J2201-622
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J2301-312
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J11-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J133-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J7-20
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J133-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J11-06
filingDate 2018-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_48a5dc3b51536ab95480b95f47221696
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d86f8b91dde21daea71a8c01f75f9462
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8279fc212bddeac2c07c276460ee709
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cba1933e5b73ab353949e6eae6aceda4
publicationDate 2020-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20200003616-A
titleOfInvention Adhesive protective film for exposure process
abstract The present invention relates to an adhesive protective film for an exposure process. The pressure sensitive adhesive protective film of the present invention is a film in which a pressure-sensitive adhesive layer formed of an adhesive composition containing an acrylic copolymer is laminated on one surface of a base film layer, and by optimizing the glass transition temperature and thickness of the pressure-sensitive adhesive layer, a PCB manufacturing process Adhesion protection film is attached to the PSR (Photo Solder Resist) printing process before UV exposure to protect the surface of PSR ink with tack characteristics so that the UV exposure process is smooth, and sufficient curing of PSR ink after UV exposure and protection after the process When the film is peeled off, there is no adhesive residue, and the peeling strength of the protective film before and after the UV exposure is small and the peelability is excellent, thereby reducing the peeling defect generated when the protective film is peeled off.
priorityDate 2018-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170090229-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20130060582-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150033324-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150069157-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100838461-B1
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7904
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8872
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6658
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7636
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419691185
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID263
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458393345
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID456653168
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID410872780
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID420017144
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID409667724
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451008030
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419474459
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID456499112
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458393726
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419474364
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419765691
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID25188
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527198
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419129972
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5247113
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425654805
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID452599253
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6581
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID408890979
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8821
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458397365
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID407276268
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7501
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7855
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID21891976
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415756202
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419474491
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID21864285
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID87595
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7343
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID62696
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID75227

Total number of triples: 63.