http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190136662-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_799858790a0d932d2bf525d1f2324ad6 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67103 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate | 2018-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d207e7c3514938a5ffdc8082756c0037 |
| publicationDate | 2019-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20190136662-A |
| titleOfInvention | Method and Apparatus for treating substrate |
| abstract | Embodiments of the present invention provide a method and apparatus for processing a substrate. The substrate processing apparatus includes a process chamber including a body having a processing space open at an upper portion thereof, and a dielectric window disposed on the body and covering the processing space; A support unit for supporting a substrate in the processing space; A gas supply unit for supplying gas to the processing space; A plasma source for generating a plasma from said gas in said processing space; And a temperature adjusting unit for adjusting the temperature of the dielectric window, wherein the temperature adjusting unit comprises: a plate disposed to face the upper portion of the dielectric window; And a cooling nozzle for supplying a cooling fluid to the space between the dielectric window and the plate, wherein the cooling nozzle may supply the cooling fluid at the side of the interspace. According to the embodiment of the present invention, the dielectric may be heated and / or cooled by the temperature control block and the cooling nozzle for supplying the cooling fluid. In addition, according to an embodiment of the present invention, the temperature control block for heating the dielectric window is located at the upper edge of the dielectric window, it is possible to minimize the loss of heat of the heater for heating the dielectric window. In addition, according to an embodiment of the present invention, the cooling fluid may be supplied from the side of the plate on which the dielectric and the exhaust hole are formed to uniformly cool the dielectric. |
| priorityDate | 2018-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.