Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3321 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32467 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32495 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32779 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3255 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4401 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
filingDate |
2019-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_712d424e333de618dbded84d58e415ad |
publicationDate |
2019-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20190135430-A |
titleOfInvention |
Plasma processing apparatus and plasma processing method |
abstract |
An object of the present disclosure is to provide a plasma processing apparatus and a plasma processing method for suppressing damage of a plasma generating unit by generating plasma. The solution of the present disclosure is a plasma processing apparatus having a plasma generation unit having a plasma electrode and performing plasma processing on a substrate contained in a processing container, wherein at least a region corresponding to the plasma electrode of the plasma generation unit is formed of synthetic quartz. It is. |
priorityDate |
2018-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |