http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190124205-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2018-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02e26278f431e84fd7dbd016498655d3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8480941479d47c204fa40dcbe910dc5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb0045d24003e2a9c6df126e51068ac8 |
| publicationDate | 2019-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20190124205-A |
| titleOfInvention | Radiation sensitive composition and pattern formation method |
| abstract | An object of the present invention is to provide a radiation sensitive composition excellent in the coating property and storage stability of the radiation sensitive composition and a pattern forming method using the same. The present invention contains a compound having a metal-oxygen covalent bond, and a solvent, wherein the metal is a metal of an element belonging to any of the fourth to seventh cycles of Groups 3 to 15 of the periodic table, and the solvent A first solvent having a viscosity at 20 ° C. of 10 mPa · s or less, a vapor pressure at 20 ° C. of 5 kPa or less, a van der Waals volume of 150 kPa 3 or less, and a second solvent different from the first solvent, The second solvent is water, a monovalent alcohol represented by R 1 -OH, R 2 -COOH, or a combination thereof, R 1 is a C 1 to C 4 monovalent organic group, and R 2 is C 1 It is a radiation sensitive composition which is more than 30 monovalent organic group. As content in all the solvents of a said 1st solvent, 50 mass% or more and 90 mass% or less are preferable. |
| priorityDate | 2017-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 283.