| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3341
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2201-0833
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2201-08 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01J3-443
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01J3-0218
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32743
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32972
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3411
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32568 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2018-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5279bc0ae1450de664f316da3f097499
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d234124be7e513dda348c4f8808368e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d036872a377c66ed8e304f704e3db888
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd97ca957ec62a8f68b493c9c1eff69d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a71d9731ebb40ed94d24f1e51fd6a17 |
| publicationDate |
2019-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20190119660-A |
| titleOfInvention |
Optical emission spectroscopy (OES) for remote plasma monitoring |
| abstract |
Methods and systems for etching substrates using a remote plasma are described. To etch the substrate, remotely excited etchants are formed in the remote plasma and flow through the showerhead into the substrate processing zone. Optical emission spectra are obtained from the substrate processing region directly above the substrate. Optical emission spectra can be used to determine the end point of etching, determine the etch rate, or otherwise characterize the etching process. Weak plasma may be present in the substrate processing region. Weak plasma may have a much lower intensity than remote plasma. In cases where no bias plasma is used over the substrate in the etching process, a weak plasma may be ignited near the viewport disposed near the side of the substrate processing region to characterize the etchant. |
| priorityDate |
2017-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |