| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_83dffc287358331deccd774ddf93f551 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76807 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 |
| filingDate |
2018-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c786cc42b8e0cfcbb21db177570c6df9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d88a2a1eb02673927172be25e4d27811
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a421a061ccdecdef2e4a3051d0dec35 |
| publicationDate |
2019-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20190114274-A |
| titleOfInvention |
Method for Dry Etching of Copper Thin Films |
| abstract |
The present invention relates to an etching method of a copper thin film, and more particularly, to an optimum etching process including an etching gas (CH 4 / Ar, CH 4 / O 2 / Ar) containing methane and the concentration of the etching gas with respect to the copper thin film. By applying the process conditions, the present invention relates to an etching method of a copper thin film capable of providing an etching profile with a high etching rate and high anisotropy (or etching slope) without re-deposition compared to an etching method of a conventional copper thin film. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021236359-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11651970-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220065373-A |
| priorityDate |
2018-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |