http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190093130-A

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filingDate 2019-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8db8a686f8ba663df0b117b048671b94
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publicationDate 2019-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20190093130-A
titleOfInvention Substrate processing method and substrate processing apparatus
abstract The substrate processing method includes a substrate holding step of holding the substrate by a substrate holder which is provided on an upper surface of the base and horizontally holds the substrate at an interval from the upper surface of the base, and a processing liquid is applied to the upper surface of the substrate. By supplying a liquid to the liquid film forming step of forming a liquid film of the processing liquid on the upper surface of the substrate, and heating the space between the substrate and the heater unit provided between the substrate and the base and the space between the substrates. The liquid film on the substrate in a state in which the substrate is heated so that the temperature of the substrate is equal to or higher than the boiling point of the processing liquid by filling and heating the fruit by the heater unit; An opening forming step of forming an opening in a central region of the substrate, and rotating the base along a vertical direction While rotating the substrate at a rotation axis, the peripheral includes the opening-up step to expand the opening. The said liquid-tight heating process is performed in parallel with the said opening expansion process in the period of at least one part of the said opening expansion process.
priorityDate 2018-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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