| abstract |
A photoresist topcoat composition comprising an aqueous base soluble polymer comprising monomers and a solvent of the general formula (I) as polymerized units: Wherein R < 1 > is selected from H, a halogen atom, C1-C3 alkyl, or C1-C3 haloalkyl; R 2 is selected from independently substituted or unsubstituted C 1 -C 12 alkyl or substituted or unsubstituted C 5 -C 18 aryl; R3 and R4 are independently H, substituted or unsubstituted C1-C12 alkyl, substituted or unsubstituted C5-C18 allyl; X is a C2-C6 substituted or unsubstituted alkylene group; X may optionally comprise one or more rings and may optionally form a ring together with R < 2 >; L 1 is a single bond or a linking group; p is an integer from 1 to 50; q is an integer of 1 to 5; A substrate coated with the disclosed topcoat composition and a method of treating the photoresist composition are also provided. The present invention finds particular application in the manufacture of semiconductor devices. |