| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2fb272959740a2231f287ac6bf4d190a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45578
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67011
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45563
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02263
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45531
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-54 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2019-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d23bab79fcf6b08c1b708394bbc05eb9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b42ccd910b989dec46ff0cf470c9882
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53eda6d3da78c38aa541fcf984877edd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f0d93b487afde76841f628e37d44f6c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6fa916dab69ecb7f8a429dd9379f7998
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e64c1dd96d6bc751b4c1128fbbc22ca7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f1211da5662178af7b8a0d59c15f8541
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5dc289693eacfb3f425c406d15e6c6e9 |
| publicationDate |
2019-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20190022590-A |
| titleOfInvention |
Gas supply nozzle, substrate processing device, method of manufacturing semiconductor device and program |
| abstract |
And provides a technique capable of improving film thickness uniformity between substrates. A nozzle proximal end portion extending in a vertical direction in a processing chamber for processing the substrate and into which a process gas for processing the substrate is introduced; and a gas supply portion for supplying the process gas into the process chamber, It is possible to provide a technique having a nozzle tip end portion having a hole and a gas stay suppression hole formed at a downstream end of the nozzle tip end portion and having a diameter larger than that of the gas supply hole. |
| priorityDate |
2015-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |