| abstract |
Disclosed is a Si-containing film forming composition comprising a precursor having the formula: ≪ RTI ID = 0.0 & [-NR-R 4 R 5 Si- (CH 2 ) t -SiR 2 R 3 -] n Wherein n is from 2 to 400; R, R 2 , R 3 , R 4 and R 5 are independently H, a hydrocarbon group or an alkylamino group, provided that at least one of R 2 , R 3 , R 4 and R 5 is H; R is independently H, a hydrocarbon group or a silyl group. Exemplary precursors include [-NH-SiH 2 -CH 2 -SiH 2 -] n and [-N (SiH 2 -CH 2 -SiH 3 ) -SiH 2 -CH 2 -SiH 2 -] n , But is not limited thereto. |