| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0262 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2016-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_42f3ea1c9b4f85befb1761f8a88d5626
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e910b7c8ac8aadb58b3aa978d1308efb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_71383d5deec9375c4431f1aaf760aeec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb16ad2b1635c9a81c584a41a97e93aa |
| publicationDate |
2018-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20180058808-A |
| titleOfInvention |
Substrate processing apparatus, gas nozzle, and manufacturing method of semiconductor device |
| abstract |
It is possible to improve the uniformity of the surface of the substrate. A processing chamber for processing a plurality of substrates and a nozzle for supplying a gas into the processing chamber, the nozzle having a slit opened in the longitudinal direction, and the slit is formed up to the apex of the tip of the nozzle. |
| priorityDate |
2016-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |