| abstract |
A resist composition which generates an acid upon exposure to light and changes its solubility in a developer by the action of an acid, wherein the resist composition comprises a base component in which solubility in a developer is changed by the action of an acid and a base component in which the acid generator (b1) . ≪ / RTI > In formula (b1), R b1 represents an aromatic hydrocarbon group having at least one alkyl group having 3 or more carbon atoms as a substituent. Y b1 represents a divalent linking group containing an ester bond (-C (= O) -O- or -OC (= O) -). V b1 represents an alkylene group, a fluorinated alkylene group or a single bond. m is an integer of 1 or more, and M m + represents an organic cation of m. [Chemical Formula 1] |