| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-14 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D327-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-65 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-65
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D327-08 |
| filingDate |
2013-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c176f1fdce4113014561a5a266f36da
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b2cbaa9fef0bd8ec66e14cb425cfb01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f29712d2dec65028e72e720e8e9aa8f2 |
| publicationDate |
2015-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20150004425-A |
| titleOfInvention |
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask |
| abstract |
A radiation sensitive or radiation sensitive resin composition comprising a compound (A) capable of generating an acid upon irradiation with an actinic ray or radiation; Wherein said acid is linked via a covalent bond to a group represented by the following general formula (M). [Wherein Y 1 and Y 2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group or an acyl group. Z represents a hydrogen atom or a substituent. * Represents a linkage site with the residue of the compound (A) |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170070198-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180002049-A |
| priorityDate |
2012-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |