| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_154f5a8a983d88f296117dcc92946ab4 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1454 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate |
2016-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d9e9a813f5e7176cac5cff9678479609
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b236e71a63b4d88f0a967b274d536c2 |
| publicationDate |
2018-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20180001390-A |
| titleOfInvention |
Cmp slurry composition for metal film and polishing method |
| abstract |
The CMP slurry composition for a metal film of the present invention comprises abrasive particles, a solvent, an oxidizing agent, a metal ion and a reducing agent. |
| priorityDate |
2016-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |