| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_356068227e13eed6ff524f07808e0bf7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
2016-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25f01fe3350196aba1c52d54673ee0db
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32f90d4b3b188706e81cadd53f8e99ff
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6bd9e75853486621c4abaca76555701c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2662d6e283c9f031d9a8356291c015bd |
| publicationDate |
2017-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20170128709-A |
| titleOfInvention |
Chemical amplified type negative resist composition |
| abstract |
The present invention relates to a chemically amplified negative photoresist composition, and more particularly, to a chemically amplified negative photoresist composition which includes a specific organic acid additive and improves a process margin in a short wavelength exposure source compared to a conventional negative type photoresist, A negative photoresist composition is disclosed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101977886-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019245172-A1 |
| priorityDate |
2016-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |