| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_356068227e13eed6ff524f07808e0bf7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2018-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6bd9e75853486621c4abaca76555701c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2662d6e283c9f031d9a8356291c015bd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32f90d4b3b188706e81cadd53f8e99ff
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25f01fe3350196aba1c52d54673ee0db |
| publicationDate |
2019-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101977886-B1 |
| titleOfInvention |
Chemical amplified type positive photoresist composition for pattern profile improvement |
| abstract |
The present invention relates to a photoresist composition for a KrF light source exhibiting a vertical profile relative to a conventional KrF positive photoresist by the addition of a resin capable of increasing the transmittance for semiconductor pattern formation, A resin, 5 to 60% by weight of a resin, 0.1 to 10% by weight of a transmittance enhancing resin additive represented by the formula (1), 0.05 to 10% by weight of a photoacid generator and 0.01 to 5% by weight of an acid diffusion inhibitor, Which has a vertical profile relative to a conventional positive photoresist, an improved sensitivity and an excellent process margin. The present invention also provides a chemically amplified positive photoresist composition for improving the pattern profile. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102374293-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023027360-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102500679-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115873175-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115873175-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102516974-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019245172-A1 |
| priorityDate |
2018-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |