http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170119537-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_985f1bf0df4204078e687f8417dc5871 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2016-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0de9f7346cb298a205d106b92b9104de http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ca33fefc4b223b953034092f269c68e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b79c83d29ad0cdb2018214bc180fcf6 |
| publicationDate | 2017-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20170119537-A |
| titleOfInvention | Plasma source and apparatus for treating substrate including the same |
| abstract | The present invention relates to a substrate processing apparatus. A substrate processing apparatus according to an embodiment of the present invention includes: a process chamber having a processing space in which a substrate is processed; A substrate support unit provided to support the substrate within the processing space; A gas supply unit for supplying a process gas into the process space; And a plasma source for exciting the process gas supplied by the gas supply unit to a plasma, wherein the process chamber is provided on an upper portion of the substrate supporting unit and includes a discharge chamber in which a space is provided in which the process gas is excited by the plasma, Wherein the plasma source comprises: a coil antenna that surrounds the discharge chamber a plurality of times along the circumferential direction; A power source for applying electric power to the coil antenna; And a Faraday shield provided between the discharge chamber and the coil antenna so as to surround a side surface of the discharge chamber, wherein the Faraday shield includes a first area and a second area alternately arranged along the vertical direction, One area is formed with a plurality of slits whose longitudinal directions are vertically spaced apart from each other along the circumferential direction. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/IE-20210105-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021509490-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220105074-A |
| priorityDate | 2016-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 32.