http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170111087-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f932d94618d9b875e401457b33e9761 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1343 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1343 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-16 |
| filingDate | 2016-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5377ad809cf7e4a7b59f8b8f494b6404 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_430fe6f6310944717d373fec9d7d8ccd |
| publicationDate | 2017-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20170111087-A |
| titleOfInvention | Composition for Etching Indium Oxide Layer |
| abstract | The present invention relates to an etching composition for an indium oxide film, which comprises nitric acid, a cyclic amine compound, a fluorine-containing compound and a hydroxylamine compound, wherein the hydroxylamine compound is contained in an amount of 0.1 to 5.0% Lt; / RTI > The etching composition according to the present invention can improve the driving characteristics of the liquid crystal display device by maintaining the etching uniformity even when the number of treatments is increased at the time of etching the indium oxide film used as the pixel electrode of the array substrate for a liquid crystal display device. |
| priorityDate | 2016-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 67.