http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100021376-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6fc8bbba7dbfdc1fe42f350fc84e17a3 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-32 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-02 |
filingDate | 2009-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ac2712e1117306bbd65d66e464a6694 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac1fb5a03fb4276f0c0af87eca392496 |
publicationDate | 2010-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-20100021376-A |
titleOfInvention | Etching liquid composition for transparent conductive film |
abstract | The subject of this invention is providing the etching liquid composition for transparent conductive films with little crystal precipitation of indium oxalate in the etching process of transparent conductive films, such as an ITO film used for a liquid crystal display.n n n This invention makes it the etching liquid composition for transparent conductive films containing an oxalic acid and an alkaline compound (except triethanolamine), The crystal | crystallization of indium oxalate can be effectively carried out even if the indium in etching liquid is high in the etching process of a transparent conductive film. It is possible to prevent. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170110893-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170111087-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200007461-A |
priorityDate | 2008-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 58.