| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D161-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G14-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G12-26 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G14-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
2015-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a2cf3f9243b10468d4363d9faa4776a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0207ac1bc5b6dff996919c7180c91bf6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31c3da48141cf33839cfbc6b5598dbc1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d338fa9da212910df6f0916095817b8 |
| publicationDate |
2017-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20170042500-A |
| titleOfInvention |
Resist underlayer film forming composition containing novolac resin reacted with aromatic methylol compound |
| abstract |
[PROBLEMS] To provide a resist underlayer film for lithography having a high solubility in a resist solvent (a solvent used for lithography) and a selectivity of a dry etching rate lower than that of a resist for developing a good film forming property. A composition for forming a resist lower layer film comprising a novolak resin comprising a structure (C) obtained by reacting an aromatic ring of an aromatic compound (A) with an aromatic methylol compound (B) containing a hydroxyl group. The aromatic compound (A) is a component for constituting the structure (C) contained in the novolak resin. When the hydroxyl group-containing aromatic methylol compound (B) is a compound represented by the formula (1): . The hydroxyl group-containing aromatic methylol compound (B) is 2-hydroxybenzyl alcohol, 4-hydroxybenzyl alcohol or 2,6-di-tert-butyl-4-hydroxymethylphenol. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11220570-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11214678-B2 |
| priorityDate |
2014-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |