| abstract |
The present invention relates to a resist composition capable of further increasing the surface resistivity of the resist surface in immersion lithography, suppressing the generation of outgas in EB or EUV lithography, and reducing the edge roughness, and a pattern forming ≪ / RTI > The present invention relates to a resin composition comprising (A) a fluorine atom-containing polymer, (B) a base resin, (C) an acid generator, (D-1) a ketone, an alkoxy group, a carbonyl group and an ester group having 5 to 8 carbon atoms A first solvent selected from alcohols having 4 to 6 carbon atoms, ethers having 3 to 6 carbon atoms and hydroxyl groups or 2 ether groups, and esters having 4 to 9 carbon atoms containing an ether group or a hydroxyl group, and (D -2) a second solvent containing a monocyclic lactone ring having 6 to 9 carbon atoms, and the second solvent is added in an amount of 200 parts by mass or more and 1,000 parts by mass or less based on 100 parts by mass of the base resin . |