abstract |
The present invention relates to a method for manufacturing a polyimide film, comprising the steps of: forming a polyimide layer (a) on one side or both sides of a polyimide layer (b) by forming a polyimide layer (a) Wherein a polyimide etching treatment time T (min) expressed by using t (min) defined by the following equation is 0.2 t? T ≪ = 5 t. ≪ / RTI > |