http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160103590-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0996ff95924a34f0a5d0d9ddb585ec8b |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-80013 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02661 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02334 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02661 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02334 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate | 2015-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c02f8ad1e57b5dfa344dc1874519e22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abb0fe6dd5a6458951d325b04d796a07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_69d44d190dabc57049f33648107c9eed http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38c53ec025549ba93f35b7671bbf7e54 |
| publicationDate | 2016-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20160103590-A |
| titleOfInvention | Substrate processing apparatus, Method for cleaning and operating the same |
| abstract | The present invention relates to a substrate processing apparatus, a cleaning method and an operating method thereof, and more particularly, to a substrate processing apparatus capable of effectively inductively cleaning deposition byproducts generated when an inorganic film and an organic film are deposited, ≪ / RTI > A substrate processing apparatus according to an embodiment of the present invention includes a chamber in which chemical vapor deposition of a thin film is performed; A showerhead provided in the chamber to dispense process gas for deposition; A substrate support provided inside the chamber and on which the substrate on which the thin film is deposited is supported; A remote plasma source for dissociating a first etch gas outside the chamber to form a plasma, and providing a plasma of the first etch gas to the showerhead via a first supply line; And an ozone generator for generating ozone to the showerhead. |
| priorityDate | 2015-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 40.