http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160094640-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f932d94618d9b875e401457b33e9761 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate | 2015-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_69aff41de55b50281a0df475b312afa7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4865e05ed279a84bb2422878b7e1b1dd |
| publicationDate | 2016-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20160094640-A |
| titleOfInvention | Etching composition for a titanium layer |
| abstract | The present invention relates to a titanium film etchant composition, and more particularly, to a titanium film etchant composition comprising a hydroxylamine, an alkanolamine, a quinoline additive, and water. The titanium film etchant composition has an excellent titanium film etching rate and has an improved corrosion inhibiting effect on a silicon oxide film and an aluminum film, thereby greatly improving productivity and reliability due to an improved etching property in a semiconductor manufacturing process. |
| priorityDate | 2015-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 101.