| abstract |
There is provided an organic coating composition, especially an antireflective coating composition, for use with an overcoated photoresist comprising a surface preparation of the formula (I) In the formula, A and B are independently hydrogen, optionally substituted alkyl or optionally substituted aryl; X and Y are each independently hydrogen, optionally substituted alkyl or optionally substituted carbocyclic aryl; And n is a positive integer. A preferred coating composition can provide an improved pattern collar margin of the overcoated photoresist layer. |