| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0751
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate |
2014-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4a4d3ac6bb54c22f6747d3546276ac8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_361faf762fd8a6663d41dbc4c8ee54ba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cdc4bea667fadb85f14456b849702703
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5833c3da18143c00d4d37a4b4db8891f |
| publicationDate |
2016-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20160064758-A |
| titleOfInvention |
Positive-type photosensitive resin composition and cured film prepared therefrom |
| abstract |
The present invention relates to a positive photosensitive resin composition and a cured film prepared therefrom, wherein the photosensitive resin composition comprises (A) a siloxane polymer containing at least one structural unit derived from a silane compound, (B) (C) a 1,2-quinonediazide compound to improve the heat resistance and chemical resistance while maintaining high transparency, which is an advantage of the composition containing the siloxane polymer, It is possible to provide a cured film excellent in stability even in a post-process. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180069613-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113448171-A |
| priorityDate |
2014-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |