| abstract |
An object of the present invention is to provide a conductive polymer composition which is excellent in antistatic property, does not adversely affect the resist, has excellent applicability, and can be suitably used for lithography using an electron beam or the like. The conductive polymer composition is characterized by containing a polyaniline-based conductive polymer (A) having a repeating unit represented by the following formula (1), a polyanion (B), and an amino acid (C). ≪ Formula 1 > (Wherein R A1 to R A4 each independently represent any of a straight, branched or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms, a hydrogen atom and a halogen atom which may have a hetero atom, and R A1 and R A2 , or R A3 and R A4 may be bonded to each other to form a ring) |