| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-423
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate |
2014-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4fd220c8e594f4d931fdf5226b401ff4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f1d8bbd2938fd8f7e5579871219c759e |
| publicationDate |
2016-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20160002950-A |
| titleOfInvention |
Pattern removing method, electronic device and method for manufacturing same |
| abstract |
It is an object of the present invention to provide a pattern peeling method which is excellent in peeling property and less damaging to a substrate, a method of manufacturing an electronic device including the pattern peeling method, and an electronic device manufactured by the above manufacturing method . The present invention relates to a resist composition comprising a resist film forming step of applying a sensitizing actinic ray or radiation-sensitive resin composition on a substrate to form a resist film, an exposure step of exposing the resist film, and a step of exposing the exposed resist film to an organic solvent And a peeling step of peeling off the negative pattern using the liquid A or B as described below. A: A solution containing a sulfoxide compound and / or an amide compound B: Liquid containing sulfuric acid and hydrogen peroxide |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190067230-A |
| priorityDate |
2013-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |