| abstract |
A positive resist composition having high sensitivity, high resolution, and good pattern shape as well as reduced line edge roughness in patterning by electron beam, X-ray, or EUV light, and the positive resist composition are used. A pattern forming method is provided. A positive resist composition comprising 21% by mass of a sulfonium salt compound having a lactone structure with respect to the total solid content in the positive resist composition, and the positive resist composition The pattern forming method used. [Selection figure] None |