| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32899
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2014-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d84c0db61590d9d629ac9a0c4808aafc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d234124be7e513dda348c4f8808368e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5279bc0ae1450de664f316da3f097499 |
| publicationDate |
2015-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20150115780-A |
| titleOfInvention |
Semiconductor processing systems having multiple plasma configurations |
| abstract |
An exemplary system may include a chamber, and the chamber is configured to contain a semiconductor substrate in a processing region of the chamber. The system may include a first remote plasma unit that is fluidly coupled to a first access of the chamber and configured to transfer the first precursor into the chamber through a first access. The system may further include a second remote plasma unit configured to be fluidly coupled with the second access of the chamber and configured to transfer the second precursor into the chamber through a second access. The first and second accesses may be fluidly coupled to a mixing region of the chamber, which is separate from the processing region of the chamber and is fluidly coupled with the processing region. The mixed region may be configured to allow the first and second precursors to interact externally with each other in the processing region of the chamber. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112534542-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210024241-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200089340-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110537241-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110537241-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11581165-B2 |
| priorityDate |
2013-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |