| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68771
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B43-27 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02219
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02175
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02172
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate |
2014-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_adb42a8719f50e616e529847942a4fb3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1371049a1999703c7999081fd934a81c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3d0a177e2d27d2846ec0274568a8ee7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e471b43328a57a6b5815d09c3e20c64d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c11ec74183510802ff99fc13ca34c389
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3acd9bba42a1fd173966d1db3bba0f88
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a140d1ec92b34d6e0c0f8a6e69cb009e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_545d76f462ae6b4bedca2154fc813f98
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70c103d3158328441f33f7be60a84090
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb10867edd9728cac2ca0cbed4fd2c5d |
| publicationDate |
2015-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20150098309-A |
| titleOfInvention |
Methods of manufacturing semiconductor devices |
| abstract |
In a method of manufacturing a semiconductor device, a substrate is loaded into a deposition chamber. A precursor flow is supplied on the substrate to form a precursor precursor film. A precursor flow and a first oxidant flow are supplied on the precursor precursor film to alternately and repeatedly form the precursor layer and the first oxidant layer. A second oxidant flow is supplied on the precursor layer or the first oxidant layer to form a second oxidant layer. The preliminary precursor film can be formed in advance to prevent the object from being damaged. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190017324-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9490140-B2 |
| priorityDate |
2014-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |