http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150093777-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2013-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ab9fd0e67049447b5c4db1f50f5e898 |
| publicationDate | 2015-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20150093777-A |
| titleOfInvention | Pattern formation method, active-light-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device |
| abstract | The pattern forming method of the present invention comprises the steps of: (a) forming a film by a sensitizing actinic ray or radiation-sensitive resin composition containing (A) - (C) (A) a resin whose polarity is increased by the action of an acid and whose solubility in a developing solution containing an organic solvent is decreased, (B) a compound which generates an acid upon irradiation with an actinic ray or radiation, and (C) a compound having a cationic site and an anionic site in the same molecule, wherein the cationic site and the anionic site are linked by a covalent bond (B) a step of exposing the film, and (C) a step of developing the exposed film using a developing solution containing an organic solvent to form a negative pattern . |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180034628-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180016306-A |
| priorityDate | 2013-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 288.