| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H2242-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32568
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32174
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32541 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2013-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5fd4348cdc0660cbbcb29f948bd638d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ebdfbf7429253fcf1ed46261652387c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87a944b33a98c9ae2deb0430e3bf2a8b |
| publicationDate |
2015-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20150082196-A |
| titleOfInvention |
Plasma processing method |
| abstract |
A capacitively coupled plasma processing apparatus for distributing and supplying high frequency power to an inner upper electrode and an outer upper electrode arranged opposite to a lower electrode for arranging a substrate, comprising: a variable capacitor As the adjustment knob for controlling the in-plane profile of the plasma density distribution characteristic or the process characteristic of the plasma. In this plasma processing apparatus, the varicocycle step selection range of the variable capacitor used for adjusting the outside / inside power division ratio is set to be the resonance region (RE S ) while avoiding the low resonance region (LE S ) and the high region Resonance region HE S , thereby improving the effect of the adjustment knob for controlling the in-plane profile of the plasma density distribution and process characteristics in the radial direction. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10867775-B2 |
| priorityDate |
2012-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |