http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140135663-A

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filingDate 2014-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d36d521f7f0e840944a8f9c6f94506b
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publicationDate 2014-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20140135663-A
titleOfInvention Controlling temperature of a faraday shield
abstract A method of controlling thermal cycling of a faraday shield in a plasma process chamber is disclosed. The method includes performing a first plasma processing operation on a first wafer within a plasma processing chamber; Terminating the first plasma processing operation; Performing a first wafer transfer operation to transfer a first wafer out of the chamber; And applying power to the TCP coil under plasma constraints during a first wafer transfer operation.
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Total number of triples: 27.