| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_985f1bf0df4204078e687f8417dc5871 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3299
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32183
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32174
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3211 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
| filingDate |
2013-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fdeef61924c04f13ca81359e2ee4cc3b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0de9f7346cb298a205d106b92b9104de
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56b3e09a8843de47fb9ad304b6029de5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a247623cc803bb293ed288bcb6835274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b79c83d29ad0cdb2018214bc180fcf6 |
| publicationDate |
2014-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140128479-A |
| titleOfInvention |
Plasma generating device and method for controlling the same, and apparatus for treating substrate comprising plasma generating device |
| abstract |
The present invention relates to a plasma generating apparatus, a control method thereof, and a substrate processing apparatus including the plasma generating apparatus. An apparatus for generating plasma according to an embodiment of the present invention includes: an RF power source for providing an RF signal; A plasma chamber in which a gas is injected to generate plasma; A first electromagnetic field inducer installed in a part of the plasma chamber and applying an RF signal to induce an electromagnetic field in the plasma chamber; A second electromagnetic field inducer installed at another part of the plasma chamber and applying an RF signal to induce an electromagnetic field in the plasma chamber; A first load coupled to the first electromagnetic field inductor; A second load connected to the second electromagnetic field inductor; And a controller for controlling power supplied to the first electromagnetic field inductor and the second electromagnetic field inductor by adjusting impedance of at least one of the first load and the second load. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022154929-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11658006-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160064288-A |
| priorityDate |
2013-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |