http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140089457-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3164a963ca21cec1151213cb1bb95e77
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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 2013-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c1ee46be89fda6f69e37ecb304ee995
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publicationDate 2014-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20140089457-A
titleOfInvention Plasma generating apparatus, method for controlling the same and apparatus for treating substrate using the same
abstract The present invention relates to a plasma generating apparatus, a method of controlling the plasma generating apparatus, and a substrate processing apparatus using the plasma generating apparatus. An apparatus for generating plasma according to an embodiment of the present invention includes: an RF power source for providing an RF signal; A plasma chamber into which a gas is injected and converts the gas into plasma; A coil installed in the plasma chamber and adapted to receive an RF signal to induce an electromagnetic field in the plasma chamber; A capacitive element connected to a ground terminal of the coil; And a controller for adjusting a ratio between the impedance of the coil and the impedance of the capacitive element.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170123740-A
priorityDate 2013-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 22.