http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140050627-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3266 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76898 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30655 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2012-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55cec2bfdcb4a8099555b99b0423e3c9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4cbc909c34303365c23cb74c31f6b3f2 |
| publicationDate | 2014-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20140050627-A |
| titleOfInvention | Plasma etching method |
| abstract | A plasma etching method in which a hole is formed by etching a silicon layer in a processing target substrate on which a patterned silicon oxide film is formed, with a first processing gas, wherein the silicon oxide film is formed by a second processing gas containing carbon monoxide gas. First deposition step S11 for depositing a protective film on the surface of the film, first etching step S12 for etching the silicon layer with the first processing gas, and second deposition for depositing a protective film on the sidewall of the hole by the second processing gas. Step S13 and 2nd etching step S14 which further etch a silicon layer by a 1st process gas are repeated, and 2nd deposition step S13 and 2nd etching step S14 are repeated alternately at least twice. |
| priorityDate | 2011-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.