http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140005314-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0aba914b6a3119aa17edde3a1f67d3f9 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T137-86485 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-448 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4485 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45561 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-448 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate | 2012-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b42246b99da77e3a50b63b71f7776a02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_558ddd3334d1743e8ad9e16860682ff9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_825b3bd6279fab467d729c5d5b6728d4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cbac4f03e2ee1c8dd685b93bce28db6d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa373845306c8fdb83cfed1cbf1a8834 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc99879e45f7938472805d137357054e |
| publicationDate | 2014-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20140005314-A |
| titleOfInvention | Raw material gas supply device of semiconductor manufacturing device |
| abstract | The present invention provides a liquid source gas supply source, a source tank for storing the liquid source gas, a gas distribution path for supplying a source gas, which is liquid source gas vapor, from the inner upper space of the source tank to the process chamber, and the gas distribution. An automatic pressure regulator interposed on the upstream side of the furnace to maintain the supply pressure of the source gas supplied to the process chamber at a set value, and a supply to open and close the source gas passage interposed on the downstream side of the gas distribution path and supplied to the process chamber. An orifice for adjusting a flow rate of a source gas supplied to a process chamber provided on at least one of an inlet side and an outlet side of the supply gas switching valve, the source tank, the gas flow path, and a supply gas switching valve; Automatic pressure regulator, consisting of a constant temperature heating device for heating the orifice to a set temperature While controlling the supply pressure of the downstream side of the raw material gas to a pressure desired to supply a source gas of a flow rate setting in the process chamber. |
| priorityDate | 2011-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 30.