| abstract |
The present invention provides a polymerizable composition capable of forming a pattern having high light blocking property in an infrared region, high light transmitting property in a visible light region, and excellent resolution in alkali development, and a photosensitive layer, a permanent pattern, and a wafer level using the same. It is to provide a lens, a solid-state imaging device and a pattern forming method; The composition also contains a polymerization initiator, a polymerizable compound, a tungsten compound, an alkali soluble binder, and an inorganic filler. |