| abstract |
In the etching solution composition, the method of forming the metal pattern and the manufacturing method of the display substrate, the etching solution composition of the copper-based metal film is 0.1% to 30% by weight of ammonium persulfate, 0.1% to 10% by weight of sulfate, 0.01% to 5% of acetate Weight percent and 55 weight percent to 99.79 weight percent water. Accordingly, the storage stability of the etchant composition and the processing ability of the substrate can be improved. |