http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20120104945-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32137
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 2012-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d37d79c1a68354cc81399a4b67b540df
publicationDate 2012-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20120104945-A
titleOfInvention Etching Methods, Etching Apparatus and Computer-readable Storage Media
abstract (Problem) Even in the silicon film in a multilayer structure, it is possible to etch using a resist film or an organic film as a mask, and the etching method which can also etch a silicon film and the silicon oxide film which exists under this silicon film collectively. To provide. (Solution means) An etching method for etching a multilayer structure including a silicon oxide film 2 and a silicon film 3 formed on the silicon oxide film 2, wherein the silicon film 3 and silicon oxide in the multilayer structure are etched. When etching the film 2 , the silicon film 3 and the silicon in the multilayer structure using the resist film 6 or the organic film as an etching mask and using an etching gas containing a CH 2 F 2 gas as the etching gas. The oxide film 2 is collectively etched.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160125896-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220024366-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210104637-A
priorityDate 2011-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002222797-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007529904-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07135198-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007258426-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002037648-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002000423-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007010099-A1
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419546761
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3084099
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6345
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419522015

Total number of triples: 33.