| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0279 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate |
2010-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5f062567583e1ff4197aee7ca9cc5a5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a06b5930866f7ec900219c3bfe2cb872
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d6af8dd7c0cc87e9165369a4681065f |
| publicationDate |
2011-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20110126627-A |
| titleOfInvention |
Organic solvent development or multi-development pattern formation method using electron beam or EV beam |
| abstract |
(1) forming a film with an actinic ray-sensitive or radiation-sensitive resin composition containing an acid-decomposable repeating unit and containing a resin capable of reducing solubility in an organic solvent by the action of an acid; (2) exposing the film with an electron beam or EUV line; And (4) developing the film with a developer containing an organic solvent in order. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150038180-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220104147-A |
| priorityDate |
2009-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |