http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20110126037-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3209 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3218 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-265 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50 |
| filingDate | 2011-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12a8dc53697a9aa533b75f401ecb5452 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ef58a1bb9ec60924e5ac12d9a312802 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9545efccb44a548b9b6194cde627ba1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da33a8620a092b8fe0a6bb1813bb4de1 |
| publicationDate | 2011-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20110126037-A |
| titleOfInvention | Cleaning composition, manufacturing method and cleaning method of a semiconductor device |
| abstract | The present invention provides a cleaning composition capable of suppressing corrosion of a metal of a semiconductor substrate and excellent in removing plasma etching residues and / or ashing residues on a semiconductor substrate, and a method and a method for manufacturing a semiconductor device using the cleaning composition. (Component a) water, (component b) amine compound, (component c) hydroxylamine and / or its salt, (component d) quaternary ammonium compound, (component e) organic acid and (component f) water-soluble organic solvent And a pH of 6 to 9, wherein the cleaning composition for removing plasma etching residues and / or ashing residues formed on the semiconductor substrate and the semiconductor device manufacturing method and cleaning method using the cleaning composition. |
| priorityDate | 2010-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 207.