| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_950bce8d103dab1bd282965fde47f9f3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30655
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2009-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50971cc3ca5b884ba6e7432ceb251655
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5b57f5ea9b21c8867fe611298f76d3c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e4173128b3d7ea60a6777b61e7879b8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6895aece2b37a86f1ff992fed360a4d |
| publicationDate |
2011-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20110095908-A |
| titleOfInvention |
Preprocess Plasma Interposed Ashing Process and Apparatus |
| abstract |
A preprocess of the plasma interposed ashing process for removing organic material from the substrate includes exposing the substrate to a plasma to selectively remove photoresist, implanted photoresist, polymer and / or residue from the substrate, wherein The plasma has a ratio of active nitrogen to active oxygen in the plasma that is greater than the ratio of active nitrogen to active oxygen obtained from the plasma formed in the gas mixture comprising oxygen gas and nitrogen gas. Plasma exhibits high throughput while minimizing and / or preventing substrate oxidation and dopant bleaching. Plasma apparatus is also disclosed. |
| priorityDate |
2008-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |