| abstract |
The present invention provides a photoresist composition having an acid labile group, a resin, an acid generator, and a compound represented by the following general formula (I), which are insoluble or poorly soluble in an aqueous alkali solution and can be dissolved in an aqueous alkali solution. Wherein Z 1 is formed by bonding a C7 to C20 alkylene group, a C3 to C20 divalent saturated cyclic group, or at least one C1 to C6 alkylene group and at least one C3 to C20 divalent saturated cyclic group A two-term term) |