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filingDate 2010-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0726efc17902544aceecb2fa3e6f271
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publicationDate 2011-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20110033097-A
titleOfInvention DC and RF Hybrid Processing Systems
abstract The present invention provides a substrate using at least one direct current (DC) / radio frequency (RF) hybrid (DC / RFH) processing system, associated DC / RFH procedures, DC / RFH process parameters, and / or a DC / RFH model. And / or an apparatus and method for processing a wafer.
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priorityDate 2009-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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